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Cleaning up an LPCVD Silicon Nitride Deposition System A typical application for a multiple-stage trap is a reactor that deposits silicon nitride (Si3N4) onto silicon wafers in an LPCVD (low pressure chemical vapor deposition) process. The deposition of silicon nitride from the thermal reaction of dichlorosilane (SiH2Cl2) and ammonia (NH3) creates large amounts of solid … Read more

Throughput Increases in Silicon Dioxide Deposition Systems​ Another common application for a multiple-stage trap is a CVD (chemical vapor deposition) process to deposit silicon dioxide onto silicon wafers. Silicon dioxide dust wears at a vacuum system, reducing pumping efficiency. Liquid silicon dioxide sources, such as tetraethylorthosilicate (TEOS), can recondense in the vacuum lines, causing valves … Read more

Multi-Stage Traps Clean Up Vacuum Systems Cleaning up an LPCVD Silicon Nitride Deposition System A typical application for a multiple-stage trap is a reactor that deposits silicon nitride (Si3N4) onto silicon wafers in an LPCVD (low pressure chemical vapor deposition) process. The deposition of silicon nitride from the thermal reaction of dichlorosilane (SiH2Cl2) and ammonia … Read more