Cleaning up an LPCVD Silicon Nitride Deposition System
Cleaning up an LPCVD Silicon Nitride Deposition System A typical application for a multiple-stage trap is a reactor that deposits silicon nitride (Si3N4) onto silicon wafers in an LPCVD (low pressure chemical vapor deposition) process. The deposition of silicon nitride from the thermal reaction of dichlorosilane (SiH2Cl2) and ammonia (NH3) creates large amounts of solid … Read more